VPD-DC-TXRF for Metallic Contamination Analysis of Ge Wafers |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
213-216 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.213 |
| Citation |
David Hellin et al., 2005, Solid State Phenomena, 103-104, 213 |
| Online since |
April, 2005 |
| Authors |
David Hellin, V. Geens, I. Teerlinck, Jan Van Steenbergen, Jens Rip, W. Laureyn, G. Raskin, Paul W. Mertens, Stefan De Gendt, Chris Vinckier |
| Keywords |
Ge, Metallic Contamination Analysis, VPD-DC-TXRF |
| Full Paper |
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