A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
27-30 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.27 |
| Citation |
Bart Onsia et al., 2005, Solid State Phenomena, 103-104, 27 |
| Online since |
April, 2005 |
| Authors |
Bart Onsia, Thierry Conard, Stefan De Gendt, Marc M. Heyns, I. Hoflijk, Paul W. Mertens, Marc Meuris, G. Raskin, Sonja Sioncke, I. Teerlinck, Antoon Theuwis, Jan Van Steenbergen, Chris Vinckier |
| Keywords |
Etching, Germanium, Oxidation, Rinsing, Stability |
| Full Paper |
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