A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
27-30 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.27 |
| Online since |
April, 2005 |
| Authors |
Bart Onsia,
Thierry Conard,
Stefan De Gendt,
Marc M. Heyns,
I. Hoflijk,
Paul W. Mertens,
Marc Meuris,
G. Raskin,
Sonja Sioncke,
I. Teerlinck,
Antoon Theuwis,
Jan Van Steenbergen,
Chris Vinckier
|
| Keywords |
Etching, Germanium, Oxidation, Rinsing, Stability |
| Full Paper |
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