Novel Photo Resist Stripping for Single Wafer Process |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
297-300 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.297 |
| Citation |
Atsushi Okuyama et al., 2005, Solid State Phenomena, 103-104, 297 |
| Online since |
April, 2005 |
| Authors |
Atsushi Okuyama, Kazumi Asada, Hitoshi Abe, Hayato Iwamoto, Yoshio Okamoto, Takuya Wada |
| Keywords |
High Dose Ion Implantation, Non Ashing, Resist Stripping, Single Wafer Process |
| Full Paper |
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