Qualification of Resist Strip Process for Ultra Low-k/Cu Interconnect |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
345-348 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.345 |
| Citation |
Han Xu et al., 2005, Solid State Phenomena, 103-104, 345 |
| Online since |
April, 2005 |
| Authors |
Han Xu, Amy Shen, Vlad Tarasov, Brian White, Josh Wolf |
| Keywords |
Low-k Dielectric, OSG, p-MSQ, Porous Low-k, Residue Clean, Resist Strip, Ultra Low-k |
| Full Paper |
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