Paper Title:
Qualification of Resist Strip Process for Ultra Low-k/Cu Interconnect
  Abstract

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Periodical
Solid State Phenomena (Volumes 103-104)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
345-348
DOI
10.4028/www.scientific.net/SSP.103-104.345
Citation
H. Xu, A. Shen, V. Tarasov, B. White, J. Wolf, "Qualification of Resist Strip Process for Ultra Low-k/Cu Interconnect", Solid State Phenomena, Vols. 103-104, pp. 345-348, 2005
Online since
April 2005
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