Paper Title:
Effect of Chemical Solution on the Stability of Low-k Films
  Abstract

The compatibility of chemical solutions with different pH is studied on microporous silica-based (SiOCH) and mesoporous methylsilsesquioxane (MSQ) based low-k materials. The surface and bulk properties of as-deposited and O2/CF4 plasma-treated low-k films have been studied after several wet treatments.

  Info
Periodical
Solid State Phenomena (Volumes 103-104)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
349-352
DOI
10.4028/www.scientific.net/SSP.103-104.349
Citation
E. Kesters, Q. T. Le, M. R. Baklanov, W. Boullart, P. W. Mertens, "Effect of Chemical Solution on the Stability of Low-k Films", Solid State Phenomena, Vols. 103-104, pp. 349-352, 2005
Online since
April 2005
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$32.00
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