Deposition Behavior of Volatile Acidic Contaminants on Metallic Interconnect Surfaces |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
365-368 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.365 |
| Citation |
Hervé Fontaine et al., 2005, Solid State Phenomena, 103-104, 365 |
| Online since |
April, 2005 |
| Authors |
Hervé Fontaine, Marc Veillerot, Adrien Danel |
| Keywords |
Airborn Molecular Contamination (AMC), Aluminium, Copper (Cu), HBr, HCl, HF, Sticking Coefficient |
| Full Paper |
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