Paper Title:
Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate Stacks
  Abstract

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Periodical
Solid State Phenomena (Volumes 103-104)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
93-96
DOI
10.4028/www.scientific.net/SSP.103-104.93
Citation
M. Claes, V. Paraschiv, S. Beckx, M. Demand, W. Deweerd, S. Garaud, H. Kraus, R. Vos, J. Snow, W. Boullart, S. De Gendt, "Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate Stacks", Solid State Phenomena, Vols. 103-104, pp. 93-96, 2005
Online since
April 2005
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