Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate Stacks |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
93-96 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.93 |
| Citation |
M. Claes et al., 2005, Solid State Phenomena, 103-104, 93 |
| Online since |
April, 2005 |
| Authors |
M. Claes, Vasile Paraschiv, S. Beckx, M. Demand, W. Deweerd, Sylvain Garaud, H. Kraus, Rita Vos, James Snow, Werner Boullart, Stefan De Gendt |
| Keywords |
Dry Etch Residue Removal, High-k, Metal Gate, Selective Wet Etching |
| Full Paper |
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