Paper Title:
HF Based Solutions for HfO2 Removal; Effect of pH and Temperature on HfO2: SiO2 Etch Selectivity
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Periodical
Solid State Phenomena (Volumes 103-104)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
97-102
DOI
10.4028/www.scientific.net/SSP.103-104.97
Citation
V. Paraschiv, M. Claes, M. R. Baklanov, W. Boullart, S. De Gendt, S. Vanhaelemeersch, "HF Based Solutions for HfO2 Removal; Effect of pH and Temperature on HfO2: SiO2 Etch Selectivity", Solid State Phenomena, Vols. 103-104, pp. 97-102, 2005
Online since
April 2005
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