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Ultra Clean Processing of Silicon Surfaces VII

Solid State Phenomena Volumes 103 - 104

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• p133 Inspection Challenges at the 45nm Technology Node   [ 298 K ]
  Authors: David Shortt, Lisa Cheung
• p137 Metrology and Removal of Nanoparticles from 500 Micron Deep Trenches   [ 289 K ]
  Authors: O. Guldiken, K. Bakhtari, Ahmed A. Busnaina, J. Park
• p141 Evaluation of Megasonic Cleaning for Sub-90nm Technologies   [ 564 K ]
  Authors: Guy Vereecke, Frank Holsteyns, Sophia Arnauts, S. Beckx, P. Jaenen, Karine Kenis, M. Lismont, Marcel Lux, Rita Vos, James Snow, Paul W. Mertens
• p147 Strength Distribution of Megasonic Damage Events   [ 16 M ]
  Authors: Kurt K. Christenson
• p151 Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning   [ 209 K ]
  Authors: Steven Verhaverbeke, Roman Gouk, Dennis Yost
• p155 Behaviour of a Well-Designed Megasonic Cleaning System   [ 584 K ]
  Authors: Alexander Lippert, P. Engesser, Garry Ferrell, J. Klitzke, Martin Köffler, Franz Kumnig, Jörg Leberzammer, Alexander Pfeuffer, Rainer Obweger, Harald Okorn-Schmidt, Harry Sax
• p159 Megasonics: A Cavitation Driven Process   [ 16 M ]
  Authors: Frank Holsteyns, Kun Tack Lee, Sabine Graf, Roger Palmans, Guy Vereecke, Paul W. Mertens
• p163 Electrophoretic Studies on Silicon Nitride: Traces of Silicates in UPW Shift Zeta Potential Similar to SC-1   [ 72 K ]
  Authors: Alexander Pfeuffer, Wolfgang Bensch, Alfred Lechner, Harald Okorn-Schmidt
• p167 Damage-Free Cleaning of Sub-50 nm Devices Using Directed Megasonics Technology in a Single Wafer Processor   [ 372 K ]
  Authors: J.J. Rosato, M.R. Yalamanchili, M.J. Beck, R.Y. Lillard
• p171 A Comparison of Particle Filtration in a Recirculated Wet Bench Wet Cleaning Tool: Performance of PTFE Filters and of Surface Optimized Filters   [ 194 K ]
  Authors: Günter Haas, Bipin Parekh, Jeremie Frankhauser, Benoît Viallet, Patrick Palka, Jérôme Bras
• p177 Influences of Oxide Loss on Contamination Removal   [ 234 K ]
  Authors: Atsuro Eitoku, James Snow, Rita Vos, Karine Kenis, Paul W. Mertens
• p181 Non-Damaging Particle Removal Using Cryogenic Aerosols   [ 16 M ]
  Authors: Thomas J. Wagener, James F. Weygand, Gregory P. Thomes
• p185 Laser Cleaning of Particles from Silicon Wafers: Capabilities and Mechanisms   [ 334 K ]
  Authors: Johannes Graf, F. Lang, M. Mosbacher, P. Leiderer
• p189 Contaminants Removal from Epi Substrates Using Vapor-Laser Process   [ 16 M ]
  Authors: A. Wachs, S. Zeid, Y. Uziel, W. Huber, J. Krueger
• p193 Chemical Additive Formulations for Particle Removal in SCCO₂-Based Cleaning   [ 362 K ]
  Authors: M.B. Korzenski, D.D. Bernhard, T.H. Baum, Koichiro Saga, Hitoshi Kuniyasu, Takeshi Hattori