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Ultra Clean Processing of Silicon Surfaces VII

Solid State Phenomena Volumes 103 - 104

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• p199 Non-Damaging CO₂ Aerosol Cleaning in FEOL IC Manufacturing   [ 16 M ]
  Authors: Souvik Banerjee, Andrea Campbell
• p203 Particle Adhesion on Tool Kit Part: Case Study for Ceramic Material   [ 402 K ]
  Authors: S. Blanc, B. Préauchat, Marc Veillerot
• p209 Simultaneous Analysis of Light and Heavy Organic Contamination on Silicon Wafer   [ 164 K ]
  Authors: Heini Ritala, Simo Eränen, Arto Kiviranta, Jaakko Räsänen, Virpi Tarkiainen, Jari Kiuru, Raimo A. Ketola
• p213 VPD-DC-TXRF for Metallic Contamination Analysis of Ge Wafers   [ 78 K ]
  Authors: David Hellin, V. Geens, I. Teerlinck, Jan Van Steenbergen, Jens Rip, W. Laureyn, G. Raskin, Paul W. Mertens, Stefan De Gendt, Chris Vinckier
• p217 Cu Spin Cleaning Evaluation by SOR X-Ray Fluorescence Analysis   [ 250 K ]
  Authors: Hidekazu Hayashi, Ken Tsugane, Yasushi Kagoshima, Takahisa Koyama, Masaharu Watanabe, Yasushi Kozuki
• p221 Application of HPLC for the Analysis of Organic Additives in Cleaning Chemicals and Cleaning Mixtures   [ 89 K ]
  Authors: S. Metzger, Bernd O. Kolbesen
• p227 Chromium Contamination in Silicon: Detection and Impact on Oxide Performances   [ 360 K ]
  Authors: Maria Luisa Polignano, Daniele Caputo, F. Cerutti, M. Cottini, L. Farini, J. Reffle
• p233 Further Reduction of Trace Level Ion from Ultra Pure Water and Its Effect on Electrical Property of Device   [ 327 K ]
  Authors: Toru Umeda, Shuichi Tsuzuki, Ryouji Kokuun, Kazuko Yoneda
• p237 Prevention of Copper Cross-Contamination on Cu Process and Non-Cu Process Mixed Fabrication   [ 334 K ]
  Authors: Joon Bum Shim, Kang Hyun Lee, Kee Ho Kim, Heung Soo Park
• p241 Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing   [ 306 K ]
  Authors: Rita Vos, E. Kesters, Sylvain Garaud, R. De Waele, Karine Kenis, Marcel Lux, H. Kraus, James Snow, Denis Shamiryan, Gabriela Catana, W. Deweerd, T. Schram, S. DeGendt, Paul W. Mertens
• p245 Direct Mixing Cleaning Method of Aqua Regia on Wafer   [ 88 K ]
  Authors: Hajime Ugajin, Hayato Iwamoto, Kei Kinoshita
• p249 Single Backside Cleaning on Silicon, Silicon Nitride and Silicon Oxide   [ 104 K ]
  Authors: Lucile Broussous, Pascal Besson, M.M. Frank, D. Bourgeat
• p255 The Degradation Prevention of Resin Materials for Semiconductor Manufacturing Equipment by Applying the Ultra-High Purity Gas Supply Technology   [ 16 M ]
  Authors: Atsushi Hidaka, Satoru Yamashita, Naoki Tanahashi, Hidekazu Ishii, Masafumi Kitano, Yasuyuki Shirai, Tadahiro Ohmi
• p259 Measurement and Control of Airborne Molecular Contamination during Wafer Storage and Transport   [ 20 M ]
  Authors: Daniel Alvarez, Allan Tram, Russell J. Holmes
• p265 Purification of Trace Amount of Metal Impurity from Ultra Pure Water Using Membrane Purifier/Filter   [ 295 K ]
  Authors: Yukio Hashimoto, Mutsuhiro Amari, Makoto Komatsu, Kunio Fujiwara