Ultra Clean Processing of Silicon Surfaces VII
Solid State Phenomena Volumes 103 - 104
doi:10.4028/www.scientific.net/SSP.103-104
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p345
Qualification of Resist Strip Process for Ultra Low-k/Cu Interconnect
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354 K
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Authors: Han Xu, Amy Shen, Vlad Tarasov, Brian White, Josh Wolf
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p349
Effect of Chemical Solution on the Stability of Low-k Films
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168 K
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Authors: E. Kesters, Quoc Toan Le, Mikhail R. Baklanov, Werner Boullart, Paul W. Mertens
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p353
Aqueous Based Single Wafer Cu/Low-k Cleaning Process Characterization and Integration into Dual Damascene Process Flow
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792 K
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Authors: Jian She Tang, Brian J. Brown, Steven Verhaverbeke, Han Wen Chen, Jim Papanu, Raymond Hung, Cathy Cai, Dennis Yost
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p357
Via Cleaning Technology for Post Etch Residues
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505 K
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Authors: B.G. Sharma, Chris Prindle
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p361
Barrier and Copper Seedlayer Wet Etching
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1 M
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Authors: Claire Therese Richard, M.M. Frank, Pascal Besson, E. Serret, N. Hotellier, Alessio Beverina, L. Dumas, Lucile Broussous, F. Kovacs, Thierry Billon
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p365
Deposition Behavior of Volatile Acidic Contaminants on Metallic Interconnect Surfaces
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189 K
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Authors: Hervé Fontaine, Marc Veillerot, Adrien Danel
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p369
Effects of Patterns on Corrosion in Cu CMP
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291 K
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Authors: Ja Hyung Han, Ja Eung Koo, Duk Ho Hong, Byung Lyul Park, Seong Il Kim, In-Soo Cho, Dae Hong Eom, Jin Goo Park, Ahmed A. Busnaina
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p373
Advanced Aqueous Cleaner II: PER Removal from Sensitive Cu/Low-k Devices
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561 K
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Authors: Chris Reid, Jerome Daviot, Douglas Holmes
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p377
Advanced Aqueous Cleaner I, Dilute Solutions for the Selective Removal of Post Etch Residues in the Presence of Aluminium
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343 K
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Authors: Jerome Daviot, Chris Reid, Douglas Holmes
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p381
New Post Etch Polymer Removal Process for Al-Interconnects and Vias in Tank and Spray Tools Using a New Inorganic Chemistry
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1 M
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Authors: Raimund Mellies, Stefan Kunz, Franz Nilius, Dieter Mayer, Andreas Kühner
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p385
Effective Polymer Removal: Process Window-Process Uniformity-Extended Chemical Bath-Life
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139 K
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Authors: Chuan Yew-Leong, Wee Boon-Lim, Wayne A-Cady, Nik A-Mustapha, Kah Keen-Lai