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Energetics and Kinetics of Defects and Impurities in Silicon from Atomistic Calculations

Journal Solid State Phenomena (Volumes 108 - 109)
Volume Gettering and Defect Engineering in Semiconductor Technology XI
Edited by B. Pichaud, A. Claverie, D. Alquier, H. Richter and M. Kittler
Pages 125-132
DOI 10.4028/www.scientific.net/SSP.108-109.125
Citation Wolfgang Windl, 2005, Solid State Phenomena, 108-109, 125
Online since December, 2005
Authors Wolfgang Windl
Keywords Ab Initio, Diffusion-Reaction Coefficients, Interface Segregation, Nitrogen Diffusion
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