Paper Title:
Impact of Hydrogenation on Electrical Properties of NiSi2 Precipitates in Silicon
  Abstract

Influence of annealing in molecular hydrogen as well as of treatment in hydrogen plasma (hydrogenation) on the electrical properties of NiSi2 precipitates in n- and p-type silicon has been studied by means of deep level transient spectroscopy (DLTS). Both annealing and hydrogenation gave rise to noticeable changes of the shape of the DLTS-peak and of the character of its dependence on the refilling pulse duration that according to [1] allows one to classify the electronic states of extended defects as “band-like” or “localized”. In both n- and p-type samples DLTS-peak in the initial as quenched samples showed bandlike behaviour. Annealing or hydrogenation of n-type samples converted the band-like states to the localised ones but differently shifted the DLTS-peak to higher temperatures. In p-type samples, the initial “band-like” behaviour of DLTS peak remained qualitatively unchanged after annealing or hydrogenation. A decrease of the DLTS-peak due to precipitates and the appearance of the peaks due to substitutional nickel and its complexes were found in hydrogenated p-type sample after removal of a surface layer of 10-20µm.

  Info
Periodical
Solid State Phenomena (Volumes 108-109)
Edited by
B. Pichaud, A. Claverie, D. Alquier, H. Richter and M. Kittler
Pages
279-284
DOI
10.4028/www.scientific.net/SSP.108-109.279
Citation
O.F. Vyvenko, N.V. Bazlov, M.V. Trushin, A.A. Nadolinski, M. Seibt, W. Schröter, G. T. Hahn, "Impact of Hydrogenation on Electrical Properties of NiSi2 Precipitates in Silicon", Solid State Phenomena, Vols. 108-109, pp. 279-284, 2005
Online since
December 2005
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Price
$32.00
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