Paper Title:
Determination of Effective Diffusion Coefficient of Copper in Silicon by Diffusion from Bulk into the Polysilicon Backside
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 108-109)
Edited by
B. Pichaud, A. Claverie, D. Alquier, H. Richter and M. Kittler
Pages
385-394
DOI
10.4028/www.scientific.net/SSP.108-109.385
Citation
M. B. Shabani, K. Hirano, Y. Shiina, T. Kihara, T. Shingyoji, "Determination of Effective Diffusion Coefficient of Copper in Silicon by Diffusion from Bulk into the Polysilicon Backside", Solid State Phenomena, Vols. 108-109, pp. 385-394, 2005
Online since
December 2005
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Price
$32.00
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