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Laser Assisted Formation on Nanocrystals in Plasma-Chemical Deposited SiNx Films

Journal Solid State Phenomena (Volumes 108 - 109)
Volume Gettering and Defect Engineering in Semiconductor Technology XI
Edited by B. Pichaud, A. Claverie, D. Alquier, H. Richter and M. Kittler
Pages 53-58
DOI 10.4028/www.scientific.net/SSP.108-109.53
Citation Sofia A. Arzhannikova et al., 2005, Solid State Phenomena, 108-109, 53
Online since December, 2005
Authors Sofia A. Arzhannikova, M.D. Efremov, Vladimir A. Volodin, G.N. Kamaev, D.V. Marin, S.A. Soldatenkov, V.S. Shevchuk, S.A. Kochubei, A.A. Popov, Yu. A. Minakov
Keywords Nonvolatile Memory, Photoluminescence (PL), Raman Scattering, Silicon Nanocrystals
Abstract

The laser assisted formation of silicon nanocrystals in SiNx films deposited on quartz and silicon substrates is studied. The Raman spectroscopy revealed creation of the Si cluster and crystallite after excimer laser treatments. Photoluminescence signal from the samples was detected at room temperatures. I-V and C-V measurements were carried out to examine carries transfer through dielectrics film as well as recharging of electronics states.

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