Pressure-Assisted Lateral Nanostructuring of the Epitaxial Silicon Layers with SiGe Quantum Wells |
|
| Journal | Solid State Phenomena (Volume 114) |
|---|---|
| Volume | High Pressure Technology of Nanomaterials |
| Edited by | Witold Lojkowski and John R. Blizzard |
| Pages | 291-296 |
| DOI | 10.4028/www.scientific.net/SSP.114.291 |
| Citation | I.V. Antonova et al., 2006, Solid State Phenomena, 114, 291 |
| Online since | July, 2006 |
| Authors | I.V. Antonova, M.B. Gulyaev, V.A. Skuratov, R.A. Soots, V.I. Obodnikov, Andrzej Misiuk, P. Zaumseil |
| Keywords | Annealing, Hydrostatic Pressure, Ion-Implantation, Precipitation, Quantum Well, Silicon-Germanium (SiGe), Strain |
| Abstract | Transformations of the SiGe/Si superlattice structures, either annealed at high pressure, or irradiated by high energy ions and subjected to post-implantation annealing, were studied and compared. Both types of treatments were found to lead to the formation of recharged defects clusters, resulting in the appearance of peaks on C-V characteristics, shrinkage of Ge profiles registered by SIMS technique after annealing, and disappearance of peaks in the free carrier profiles. The effects were more pronounced in the case of high energy ion implantation. The results are explained by the vacancy - assisted precipitation of Ge in SiGe layers. |
| Full Paper | 
Get the full paper by clicking here
|
First page example
