Paper Title:
Comparative Evaluation of TiN/CrN, AlN/CrN, TiAlN/CrN Multilayer Films for the Use of Semi-Solid Processing of Cu Alloys
  Abstract

In order to investigate the effect of PVD coatings on the performance of proto-type high temperature mold and to identify the best candidate thin films for Cu semi-solid processing, TiAlN/CrN multilayer coatings with various superlattice periods was synthesized using a closed field unbalanced magnetron sputtering method with separate Cr and TiAl and characteristics of these films were compared with those from TiN/CrN and AlN/CrN films in terms of microstructure, nanoindentation hardness, and oxidation test at 900 in air. TiN/CrN film showed the best mechanical properties but their oxidation resistance, the most critical property for high temperature semi-solid processing was the poorest. Therefore TiAlN films with a superlattice period of 6.1nm which has intermediate plastic deformation resistance with the best oxidation resistance were considered to be the best candidate out of three different films studied in this work.

  Info
Periodical
Solid State Phenomena (Volumes 116-117)
Edited by
C.G. Kang, S.K. Kim and S.Y. Lee
Pages
124-127
DOI
10.4028/www.scientific.net/SSP.116-117.124
Citation
S. Y. Lee, S. Y. Lee, "Comparative Evaluation of TiN/CrN, AlN/CrN, TiAlN/CrN Multilayer Films for the Use of Semi-Solid Processing of Cu Alloys", Solid State Phenomena, Vols. 116-117, pp. 124-127, 2006
Online since
October 2006
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: K. Moto, Stan Veprek
Abstract:As alternative to TiN based material, nc-(Ti1-xAlx)N and h-AlN were deposited on steel substrate using plasma CVD technique and characterized...
219
Authors: F. Giuliani, A. Goruppa, S.J. Lloyd, Dennis Teer, W.J. Clegg
Abstract:Observations elsewhere have shown that multilayer structures with layers ~10 nm thick can be harder than monolithic ones. Here we see whether...
335
Authors: Tao Zhang, Wen Zhao Li, Hai Yun Jin, Guan Jun Qiao, Zhi Hao Jin
Abstract:The AlN/Ti laminated composites were fabrication by plasma activated sintering. In the composites, the AlN layers were matrix layers and the...
348
Authors: Jian Min Liu, Han Shui Wu
Thin Films
Abstract:Freestanding diamond film was prepared by hot filament chemical vapor deposition (HFCVD) method. Inter-Digital Transducer (IDT) was formed on...
2213
Authors: Qing Tao, Yan Wei Sui, Sun Zhi, Wei Song
Chapter 3: Optical and Electronic Materials
Abstract:AlN and TiN thin films are widely used in electronic devices and acoustic material and other fields because of its unique merit, the...
274