Paper Title:
Comparative Study on the Oxidation Resistance between Ti-Al-Si-N and Ti-Al-N Coatings
  Abstract

High-temperature oxidation behaviors of Ti-Al-Si-N and Ti-Al-N films were comparatively investigated in this work. Two kinds of Ti0.75Al0.25N and Ti0.69Al0.23Si0.08N films were deposited on WC-Co substrates by a DC magnetron sputtering method using separate Ti3Al(99.9%) and Si(99.99%) targets in a gaseous mixture of Ar and N2. Si addition of 8 at.% into Ti-Al-N film modified its microstructure to a fine composite comprising, Ti-Al-N crystallites and amorphous Si3N4, and to a smoother surface morphology. While the solid solution Ti0.75Al0.25N film had superior oxidation resistance up to around 700, the composite Ti-Al-Si-N film showed further enhanced oxidation resistance. Both Al2O3 and SiO2 layers played roles as a barrier against oxygen diffusion for the quaternary Ti-Al-Si-N film, whereas only the Al2O3 oxide layer formed at surface did a role for the Ti-Al-N film. Oxidation behavior and mechanical stability of the films after oxidation were compared between two films using instrumental analyses such as XRD, GDOES, XPS, and scratch test.

  Info
Periodical
Solid State Phenomena (Volume 118)
Edited by
Jang Hyun Sung, Chan Gyu Lee, Yong Zoo You, Young Kook Lee and Jae Young Kim
Pages
317-322
DOI
10.4028/www.scientific.net/SSP.118.317
Citation
J. W. Kim, S. Abraham, K. H. Kim, J. H. Sung, J. J. Moore, "Comparative Study on the Oxidation Resistance between Ti-Al-Si-N and Ti-Al-N Coatings", Solid State Phenomena, Vol. 118, pp. 317-322, 2006
Online since
December 2006
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