Paper Title:
The Ballistic Electron Emission Microscopy in the Characterization of Quantum Dots
  Abstract

Ballistic electron emission microscopy (BEEM) is a new method by apply the spatial resolution capabilities of the scanning tunneling microscope (STM) to investigate electron transport properties in the quantum dots. This method requires three terminals: a sharp tip to inject electrons, a conductive layer and a semiconductor substrate. The transport-related properties of the sample can be obtained by using the characteristic of the injected and collected electrons. In this paper proposed a BEEM model for the silicon quantum dots (Si-QDs) on SiO2 layer prepared by LPCVD technique. SiO2 layer was thermally grown on p-type Si (100) wafer in dry O2 atmosphere and a thin gold layer cap used to provide a conductive layer on top of the Si-QDs for the BEEM characterization.

  Info
Periodical
Solid State Phenomena (Volumes 121-123)
Edited by
Chunli BAI, Sishen XIE, Xing ZHU
Pages
529-532
DOI
10.4028/www.scientific.net/SSP.121-123.529
Citation
S.D. Hutagalung, K.A. Yaacob, Y.C. Keat, "The Ballistic Electron Emission Microscopy in the Characterization of Quantum Dots", Solid State Phenomena, Vols. 121-123, pp. 529-532, 2007
Online since
March 2007
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Price
$32.00
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