Paper Title:
Defect Engineering in Self-Assembled 3D Photonic Crystals
  Abstract

This work describes the combination of photolithography and self-assembly methods for fabrication of 3D photonic crystals (PCs) with well-defined micron-scale line defects embedded in the PCs. Line defects with different dimensions, shapes, and compositions have been introduced into the 3D PCs by choosing different photoresists, masks, and template-directed assembly techniques. Infiltration of carbon using high-temperature chemical vapor deposition (CVD) technique showed that the fabrication procedure offers an ideal approach to functional 3D photonic devices from self-assembled photonic crystals.

  Info
Periodical
Solid State Phenomena (Volumes 121-123)
Edited by
Chunli BAI, Sishen XIE, Xing ZHU
Pages
57-60
DOI
10.4028/www.scientific.net/SSP.121-123.57
Citation
Q. F. Yan, Z. C. Zhou, F. B. Su, X.S. Zhao, "Defect Engineering in Self-Assembled 3D Photonic Crystals", Solid State Phenomena, Vols. 121-123, pp. 57-60, 2007
Online since
March 2007
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Price
$32.00
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