Paper Title:
Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template
  Abstract

Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.

  Info
Periodical
Solid State Phenomena (Volumes 121-123)
Edited by
Chunli BAI, Sishen XIE, Xing ZHU
Pages
661-664
DOI
10.4028/www.scientific.net/SSP.121-123.661
Citation
H. Lee, K. Y. Yang, S. H. Hong, C.D. Schaper, G. Y. Jung, "Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template", Solid State Phenomena, Vols. 121-123, pp. 661-664, 2007
Online since
March 2007
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Price
$32.00
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