Paper Title:
Fabrication of 100nm Sized Patterns on a Non-Planar Substrate by Using Nanoimprinting Lithography
  Abstract

A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

  Info
Periodical
Solid State Phenomena (Volumes 121-123)
Edited by
Chunli BAI, Sishen XIE, Xing ZHU
Pages
665-668
DOI
10.4028/www.scientific.net/SSP.121-123.665
Citation
H. Lee, J. Y. Huh, K. Y. Yang, S. H. Hong, G. Y. Jung, "Fabrication of 100nm Sized Patterns on a Non-Planar Substrate by Using Nanoimprinting Lithography", Solid State Phenomena, Vols. 121-123, pp. 665-668, 2007
Online since
March 2007
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$32.00
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