Paper Title:
Fabrication of Porous Al2O3 and TiO2 Thin Film Hybrid Composite Using Atomic Layer Deposition and Properties Study
  Abstract

Atomic layer deposition (ALD) has been used in advanced applications where thin layers of materials with precise thickness down to the nanometer scale are needed. Using anodic oxidation, we prepared the porous alumina. Anodic oxidation was carried out in 5C 0.3M oxalic acid with anodizing voltages (~ 40 V) and two step anodization method. SEM shows that, these porous anodic oxides are well aligned and organized into high-density uniform arrays. Afterward, titanium dioxide thin films were coated by ALD on the porous anodic aluminum oxide. ALD films were influenced by the deposited interface morphology between Al2O3 and TiO2 and narrow channel of ~ 10 nm was obtained by controlling ALD cycle.

  Info
Periodical
Solid State Phenomena (Volumes 124-126)
Edited by
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
Pages
1273-1276
DOI
10.4028/www.scientific.net/SSP.124-126.1273
Citation
S.J. Park, B.K. Ahn, P. S. Alegaonkar, H.J. Shin, J. B. Yoo, "Fabrication of Porous Al2O3 and TiO2 Thin Film Hybrid Composite Using Atomic Layer Deposition and Properties Study", Solid State Phenomena, Vols. 124-126, pp. 1273-1276, 2007
Online since
June 2007
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$32.00
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