Paper Title:
The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering
  Abstract

RF sputtering process was applied to produce thin hydroxyapatite(HAp, Ca10(PO4)6(OH)2) films on Ti-6Al-4V alloy substrates. The effects of different heat treatment conditions on the bonding strength between HAp thin films and Ti-6Al-4V alloy substrates were studied. Before deposition, the Ti-6Al-4V alloy substrates were heat treated for 1hr at 850°C under 3.0×10-3torr, and after deposition, the HAp thin films were heat treated for 1hr at 400°C, 600°C and 800°C under the atmosphere, and analyzed optical microscope, FESEM, FTIR, XRD, nano-indentor, micro-vickers hardness, respectively. Experimental results represented that the HAp thin films on the heat treated substrates had higher hardness than none-heat treated substrates before the deposition.

  Info
Periodical
Solid State Phenomena (Volumes 124-126)
Edited by
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
Pages
1433-1436
DOI
10.4028/www.scientific.net/SSP.124-126.1433
Citation
C. H. Jung, S. K. Kim, C. W. Jang, J. H. Lee, S. H. Lee, J. S. Song, I. S. Kim, S. J. Jeong, "The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering", Solid State Phenomena, Vols. 124-126, pp. 1433-1436, 2007
Online since
June 2007
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Price
$32.00
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