Paper Title:
Impact and Indentation Resistance of Superhard AlCrN Thin Films
  Abstract

Binary transition metal nitride films have excellent tribological properties but these binary systems are still inadequate for high temperature applications due to their low oxidation temperature. Above 700°C, formation of porous oxides at the film surface deteriorates their mechanical properties rapidly by the. Especially impact and indentation resistance of these films deteriorate very quickly. In order to overcome these problems, Al based Al1-xCrxN films with X=0.29 and X=0.69 were synthesized by closed field unbalanced magnetron sputtering with vertical magnetron sources and their chemical composition, crystalline structure, morphology and mechanical properties including impact and indentation resistance were investigated. Synthesized Al1-xCrxN films formed solid solution showing FCC B1 type structure with strong (111) preferential orientation and films with X=0.29 showed a superhard hardness value of approximately 41GPa while films with X=0.69 did approximately 31GPa. While there was insignificant difference between Al1-xCrxN films with X=0.29 and X=0.69 in terms of Rockwell C indentation resistance, much improved impact resistance could be observed from the Al1-xCrxN films with X=0.29.

  Info
Periodical
Solid State Phenomena (Volumes 124-126)
Edited by
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
Pages
1609-1612
DOI
10.4028/www.scientific.net/SSP.124-126.1609
Citation
S. Y. Lee, "Impact and Indentation Resistance of Superhard AlCrN Thin Films", Solid State Phenomena, Vols. 124-126, pp. 1609-1612, 2007
Online since
June 2007
Authors
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Sang Shik Park, Hee Jung Lee, Ik Hyun Oh, Byong Taek Lee
Abstract:Ag-doped hydroxyapatite films were deposited on a ZrO2 substrate using r.f. magnetron sputtering to improve the bioaffinity and mechanical...
113
Authors: Bum Rae Cho
Abstract:Indium tin oxide (ITO) used in many applications such as electronic and optical devices were deposited on the soda lime glass substrate by...
195
Authors: Shu Yong Tan, Xu Hai Zhang, Xiang Jun Wu, Feng Fang
Abstract:CrNx films were synthesized under graded/constant bias by DC magnetron sputtering. In the present work, the graded bias deposited CrNx films...
1476
Authors: Fei Xiong Mao, Tao Liu, Shi Wei Liu, Jing Kun Yu
Chapter 16: Sustainable Manufacturing Technologies
Abstract:Mg films were prepared by magnetron sputtering on zirconia substrate. The surface morphology, structure and adhesion performance were...
2834
Authors: C.L. Zhong, P.A. Wei, L.E. Luo
Chapter 1: Material Engineering and its Application Technology
Abstract:A series of Ti1-xAlxN thin films were deposited by reactive magnetron sputtering. The content, microstructure and the hardness of the thin...
93