Paper Title:
Electrical/Mechanical Properties of Porous Low-k Thin Films by Using Various Supramolecule Based Porogen
  Abstract

The porous SSQ (silsesquioxane) films were prepared by using alkoxy silyl substituted cyclodextrin (sCD) and methyl substituted cyclodextrin (tCD) based porogen. The mechanical and electrical properties of these deposited films were investigated for the applications as low dielectric materials. The mechanical properties of porous film by using sCD are worse than those by using tCD due to its high pore interconnection length. sCD templated porous films show almost constant pore diameter as a function of porogen concentration due to strong linear polymerization of the sCD molecules through polycondensation.

  Info
Periodical
Solid State Phenomena (Volumes 124-126)
Edited by
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
Pages
185-188
DOI
10.4028/www.scientific.net/SSP.124-126.185
Citation
J. H. Yim, Y. K. Park, J. K. Jeon, "Electrical/Mechanical Properties of Porous Low-k Thin Films by Using Various Supramolecule Based Porogen", Solid State Phenomena, Vols. 124-126, pp. 185-188, 2007
Online since
June 2007
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$32.00
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