Atomic Arrangement and Formation Mechanism of c-Axis Oriented ZnO Thin Films Grown on p-Si Substrates |
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| Journal | Solid State Phenomena (Volumes 124 - 126) |
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| Volume | Advances in Nanomaterials and Processing |
| Edited by | Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park |
| Pages | 93-96 |
| DOI | 10.4028/www.scientific.net/SSP.124-126.93 |
| Citation | N.K. Park et al., 2007, Solid State Phenomena, 124-126, 93 |
| Online since | June, 2007 |
| Authors | N.K. Park, H.S. Lee, Y.S. No, Tae Whan Kim, Jeong Yong Lee, W.K. Choi |
| Keywords | Atomic Arrangement, Formation Mechanism, Si Substrate, Structural Properties, ZnO Films |
| Abstract | The X-ray diffraction (XRD) pattern for the ZnO films grown on Si (100) substrates indicates that the grown ZnO films have a strong c-axis orientation. The pole figure indicates that ZnO thin films have columnars with the grains of the [0002] crystallographic axis perpendicular to the Si (100) substrate, indicative of the random rotational orientations along the c-axis. Selected area electron diffraction pattern (SADP) of the ZnO/Si (100) heterostructures shows that the ZnO preferential oriented film is formed on the Si substrate. A possible atomic arrangement of the crystal structure and the formation mechanism of the c-axis orientated ZnO thin films grown on p-Si substrates are discussed on the basis of the XRD, the pole figure, and SADP results. |
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