To make a dense CIGS absorber layer, spray deposited CIGS films were annealed in the two-zone RTP furnace in Se atmosphere. More Se supply by increasing Se evaporation temperature or by increasing the flow rate of carrier gas resulted in the larger CIGS grains. However, a thick MoSe2 layer was formed between CIGS and Mo, as the Se supply increased, results in partial detachment of CIGS/MoSe2/Mo layers from the glass substrate. From the result, it was found that the short heat- treatment with high Se vapor pressure is better than the long heat-treatment with low Se vapor pressure. The large CIGS grains without peeling off, can be obtained from the following conditions; Se evaporation temperature of 450oC, substrate temperature of 550oC, annealing time of 5 min, and flow rate of carrier gas of 30 sccm.