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Mono- and Polycrystalline Silicon for Terahertz Intracenter Lasers

Journal Solid State Phenomena (Volumes 131 - 133)
Volume Gettering and Defect Engineering in Semiconductor Technology XII
Edited by A. Cavallini, H. Richter, M. Kittler and S. Pizzini
Pages 579-582
DOI 10.4028/www.scientific.net/SSP.131-133.579
Citation Sergeij G. Pavlov et al., 2007, Solid State Phenomena, 131-133, 579
Online since October, 2007
Authors Sergeij G. Pavlov, Heinz Wilhelm Hübers, Nikolay V. Abrosimov, H. Riemann
Keywords Polycrystalline Silicon, Silicon Laser
Abstract

The performance of optically pumped terahertz silicon lasers with active media made from mono- and polycrystalline silicon doped by phosphorus has been investigated. The polycrystalline silicon samples consist of grains with a characteristic size distribution in the range from 50 to 500 m. Despite of significant changes of the principal phonon spectrum and increased scattering of phonons at grain boundaries, the silicon laser made from polycrystalline material has a laser threshold and an operation temperature only slightly worse than that of monocrystalline silicon lasers.

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