Main Theme:

Ultra Clean Processing of Semiconductor Surfaces VIII

Volume 134
doi: 10.4028/www.scientific.net/SSP.134
Paper Titles published in this Main Theme:
Paper Title Page

Acknowledgements

Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.

Authors: Gerardo Montaño-Miranda, Anthony Muscat

3

Evaluation of the Plasmaless Gaseous Etching Process

Authors: Yoshiya Hagimoto, Hajime Ugajin, Daisuke Miyakoshi, Hayato Iwamoto, Yusuke Muraki, Takehiko Orii

7

Single Wafer Hydrophobic Surface Preparation on 300mm by HF Vapor

Authors: Thierry Salvetat, Olivier Pollet, Pascal Besson, Névine Rochat

11

Insights into HF-Last Processes and Particle Performance in a Single Wafer Spin Cleaning Tool

Authors: Gim Chen, Ismail Kashkoush

15

Implementing an In Situ Surface Preparation Prior to Ni Deposition for Ni Salicide Processes

Authors: Kyuh Wan Chang, Scott Bolton, Marc Rossow, Rich Gregory, Jack Jiang, Dharmesh Jawarani, Stefan Zollner, Dean Denning, Jon Cheek

19

Electrical Impact of Various Arsenic-Residues Cleanings

Authors: Y.S. Tan, S.P. Chiew, Z. Yang, Zainab Ismail, Felicia Goh, Christopher Lim, Vincent Sih, Ee Ping Yu, Goh Boon Cheng

23

Elimination of Watermark on Extremely High-Doped Poly-Silicon Surfaces Using HF-Vapor Cleaning

Authors: Kang Heon Lee, John Ghekiere, Joon Bum Shim, Eric J. Bergman, Gyu Hyun Kim, Bai Kil Choi, Kee Joon Oh, Geun Min Choi

27

Passivation Studies of Germanium Surfaces

Authors: Jung Yup Kim, Jim McVittie, Krishna Saraswat, Yoshio Nishi

33

Germanium Surface Passivation Using Ozone Gaseous Phase

Authors: Virginie Loup, Pascal Besson, Olivier Pollet, Eugénie Martinez, Emmanuelle Richard, Sandrine Lhostis

37

Showing 1 to 10 of 89 Paper Titles