Ultra Clean Processing of Semiconductor Surfaces VIII
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Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination. Authors: Gerardo Montaño-Miranda, Anthony Muscat |
3 |
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Evaluation of the Plasmaless Gaseous Etching Process Authors: Yoshiya Hagimoto, Hajime Ugajin, Daisuke Miyakoshi, Hayato Iwamoto, Yusuke Muraki, Takehiko Orii |
7 |
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Single Wafer Hydrophobic Surface Preparation on 300mm by HF Vapor Authors: Thierry Salvetat, Olivier Pollet, Pascal Besson, Névine Rochat |
11 |
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Insights into HF-Last Processes and Particle Performance in a Single Wafer Spin Cleaning Tool Authors: Gim Chen, Ismail Kashkoush |
15 |
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Implementing an In Situ Surface Preparation Prior to Ni Deposition for Ni Salicide Processes Authors: Kyuh Wan Chang, Scott Bolton, Marc Rossow, Rich Gregory, Jack Jiang, Dharmesh Jawarani, Stefan Zollner, Dean Denning, Jon Cheek |
19 |
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Electrical Impact of Various Arsenic-Residues Cleanings Authors: Y.S. Tan, S.P. Chiew, Z. Yang, Zainab Ismail, Felicia Goh, Christopher Lim, Vincent Sih, Ee Ping Yu, Goh Boon Cheng |
23 |
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Elimination of Watermark on Extremely High-Doped Poly-Silicon Surfaces Using HF-Vapor Cleaning Authors: Kang Heon Lee, John Ghekiere, Joon Bum Shim, Eric J. Bergman, Gyu Hyun Kim, Bai Kil Choi, Kee Joon Oh, Geun Min Choi |
27 |
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Passivation Studies of Germanium Surfaces Authors: Jung Yup Kim, Jim McVittie, Krishna Saraswat, Yoshio Nishi |
33 |
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Germanium Surface Passivation Using Ozone Gaseous Phase Authors: Virginie Loup, Pascal Besson, Olivier Pollet, Eugénie Martinez, Emmanuelle Richard, Sandrine Lhostis |
37 |
