Impact of RF Oxygen Plasma on Thermal Oxide Etch-Rate |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
125-128 |
| DOI |
10.4028/www.scientific.net/SSP.134.125 |
| Citation |
Enrico Bellandi et al., 2007, Solid State Phenomena, 134, 125 |
| Online since |
November, 2007 |
| Authors |
Enrico Bellandi, Annamaria Votta, Francesco Pipia, Matteo Ferrerio, Cinzia De Marco, Simone Alba, Mauro Alessandri |
| Keywords |
Etch Rate Profiles, Plasma Damage, Resist Removal |
| Full Paper |
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