Insights into HF-Last Processes and Particle Performance in a Single Wafer Spin Cleaning Tool |
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| Journal | Solid State Phenomena (Volume 134) |
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| Volume | Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by | Paul Mertens, Marc Meuris and Marc Heyns |
| Pages | 15-18 |
| DOI | 10.4028/www.scientific.net/SSP.134.15 |
| Online since | November, 2007 |
| Authors | Gim Chen, Ismail Kashkoush |
| Keywords | Bare Silicon Wafer, HF Last, Particle Contamination, Single Wafer Processing |
| Full Paper | 
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