Materials Science & Technology

FULLTEXT SEARCH
NEW: Advanced Search

Particle Deposition and Removal from Ge Wafers

Journal Solid State Phenomena (Volume 134)
Volume Ultra Clean Processing of Semiconductor Surfaces VIII
Edited by Paul Mertens, Marc Meuris and Marc Heyns
Pages 173-176
DOI 10.4028/www.scientific.net/SSP.134.173
Citation Sonja Sioncke et al., 2007, Solid State Phenomena, 134, 173
Online since November, 2007
Authors Sonja Sioncke, Marcel Lux, Wim Fyen, Marc Meuris, Paul W. Mertens, Antoon Theuwis
Keywords Cleaning, Etching, Germanium, Particle Deposition, Particle Removal
Full Paper PDF Get the full paper by clicking here

First page example

Preview of first page