Paper Title:
New FEOL Cleaning Technology for Advanced Devices beyond 45 nm Node
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
185-188
DOI
10.4028/www.scientific.net/SSP.134.185
Citation
H. Tomita, Y. Yamada , H. Nagashima, N. Ishikawa, Y. Taniguchi, "New FEOL Cleaning Technology for Advanced Devices beyond 45 nm Node", Solid State Phenomena, Vol. 134, pp. 185-188, 2008
Online since
November 2007
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Alexander Lippert, P. Engesser, Garry Ferrell, J. Klitzke, Martin Köffler, Franz Kumnig, Jörg Leberzammer, Alexander Pfeuffer, Rainer Obweger, Harry Sax, Harald Okorn-Schmidt
155
Authors: Atsuro Eitoku, James Snow, Rita Vos, Karine Kenis, Paul W. Mertens
177
Authors: Daniel A. Koos, Julia Svirchevski, Daniel J. Vitkavage, David G. Hansen, Karen A. Reinhardt, Frank Huang, Marie Mitchel, Guang Ying Zhang
291
Authors: Jae Gon Choi, Hyo Geun Yoon, Woo Jin Kim, Geun Min Choi, Young Wook Song, Jin Goo Park
303
Authors: John Niccoli, Matt Cogrono, Michelle Eastlack, Dave McCane, Craig Carlson, Erik Young, Dave Chapek
Abstract:The interaction between photo resist and highly polymerizing dry etch chemistries results in the deposition of fluoropolymers on the bevel...
155