Implementing an In Situ Surface Preparation Prior to Ni Deposition for Ni Salicide Processes |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
19-22 |
| DOI |
10.4028/www.scientific.net/SSP.134.19 |
| Online since |
November, 2007 |
| Authors |
Kyuh Wan Chang,
Scott Bolton,
Marc Rossow,
Rich Gregory,
Jack Jiang,
Dharmesh Jawarani,
Stefan Zollner,
Dean Denning,
Jon Cheek
|
| Keywords |
Nickel Silicide, Phase Transformation, Reactive Preclean, Salicide, Sputter Etch, Surface Preparation, Wafer Cleaning |
| Full Paper |
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