Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
201-204 |
| DOI |
10.4028/www.scientific.net/SSP.134.201 |
| Citation |
Frank Holsteyns et al., 2007, Solid State Phenomena, 134, 201 |
| Online since |
November, 2007 |
| Authors |
Frank Holsteyns, Tom Janssens, Sophia Arnauts, Wouter Van der Putte, Vincent Minsier, Johann Brunner, Joachim Straka, Paul W. Mertens |
| Keywords |
Bubble Generation, Cavitation, Megasonic, Nozzle |
| Full Paper |
Get the full paper by clicking here
|
