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Low Si Recess on Cleaning Process by Dilute HF/SC-1 with Megasonic

Journal Solid State Phenomena (Volume 134)
Volume Ultra Clean Processing of Semiconductor Surfaces VIII
Edited by Paul Mertens, Marc Meuris and Marc Heyns
Pages 209-212
DOI 10.4028/www.scientific.net/SSP.134.209
Citation Ji Hoon Cha et al., 2007, Solid State Phenomena, 134, 209
Online since November, 2007
Authors Ji Hoon Cha, Chang Sup Mun, Dae Hyuk Kang, Woo Gwan Shim, Kun Tack Lee, Chang Ki Hong, Han Ku Cho, Joo Tae Moon
Keywords Cleaning, HF, Megasonic, Particle, Recess, SC-1, Silicon
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