Paper Title:

Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe

Periodical Solid State Phenomena (Volume 134)
Main Theme Ultra Clean Processing of Semiconductor Surfaces VIII
Edited by Paul Mertens, Marc Meuris and Marc Heyns
Pages 243-246
DOI 10.4028/www.scientific.net/SSP.134.243
Citation Kenichi Sano et al., 2007, Solid State Phenomena, 134, 243
Online since November, 2007
Authors Kenichi Sano, Frederik E. Leys, G. Dilliway, Roger Loo, Paul W. Mertens, James Snow, Akira Izumi, Atsuro Eitoku
Keywords Dry, Epi, HF, Silicon, Silicon-Germanium (SiGe), Single Wafer Cleaning
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