Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
243-246 |
| DOI |
10.4028/www.scientific.net/SSP.134.243 |
| Citation |
Kenichi Sano et al., 2007, Solid State Phenomena, 134, 243 |
| Online since |
November, 2007 |
| Authors |
Kenichi Sano, Frederik E. Leys, G. Dilliway, Roger Loo, Paul W. Mertens, James Snow, Akira Izumi, Atsuro Eitoku |
| Keywords |
Dry, Epi, HF, Silicon, Silicon-Germanium (SiGe), Single Wafer Cleaning |
| Full Paper |
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