Paper Title:
Study of Static Electricity in Wafer Cleaning Process
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
263-266
DOI
10.4028/www.scientific.net/SSP.134.263
Citation
M. Wada, T. Sueto, H. Takahashi, N. Hayashi, A. Eitoku, "Study of Static Electricity in Wafer Cleaning Process", Solid State Phenomena, Vol. 134, pp. 263-266, 2008
Online since
November 2007
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Glen Westwood, Anatolio Pigliucci, Thomas Oszinda, Susanne Leppack, Matthias Schaller
Chapter 7: Back-End-of-Line Cleaning
Abstract:Mallinckrodt Baker, Inc. (MBI) has developed an aqueous fluoride-based cleaner (AFC1) that shows improved ultra-low k (ULK) and cobalt...
249
Authors: Sayan Plong-Ngooluam, Nattha Jindapetch, Phairote Wounchoum, Duangporn Sompongse
Chapter 4: Power and Electrical Engineering
Abstract:This paper reports a 3-D computational simulation of electrostatic potential uniformity which was affected by various measurement plates. The...
308