Elimination of Watermark on Extremely High-Doped Poly-Silicon Surfaces Using HF-Vapor Cleaning |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
27-30 |
| DOI |
10.4028/www.scientific.net/SSP.134.27 |
| Online since |
November, 2007 |
| Authors |
Kang Heon Lee,
John Ghekiere,
Joon Bum Shim,
Eric J. Bergman,
Gyu Hyun Kim,
Bai Kil Choi,
Kee Joon Oh,
Geun Min Choi
|
| Keywords |
Dual Poly Gate, HF Vapor, Single Wafer, Tungsten Silicide |
| Full Paper |
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