Paper Title:
Advanced Metrologies for Cleans Characterization: ARXPS, GIXF and NEXAFS
  Abstract

  Info
Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
281-284
DOI
10.4028/www.scientific.net/SSP.134.281
Citation
T. Conard, S. List, M. Claes, B. Beckhoff, "Advanced Metrologies for Cleans Characterization: ARXPS, GIXF and NEXAFS ", Solid State Phenomena, Vol. 134, pp. 281-284, 2008
Online since
November 2007
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Martine Claes, Quoc Toan Le, J. Keldermans, Els Kesters, Marcel Lux, A. Franquet, Guy Vereecke, Paul W. Mertens, M.M. Frank, Robert Carleer, P. Adriaensens, D. Vanderzande
325
Authors: Francesco Pipia, Annamaria Votta, Gloria Obetti, Enrico Bellandi, Mauro Alessandri, Thomas Nolan
367
Authors: Florentina Niebelschütz, Thomas Stauden, Katja Tonisch, Jörg Pezoldt
Abstract:In order to realize complex three dimensional or free standing structures on SiC substrates, an undercut, i.e. a selective isotropic etching...
849
Authors: Tae Gon Kim, Quoc Toan Le, Samuel Suhard, Marcel Lux, Guy Vereecke, Martine Claes, Herbert Struyf, Stefan De Gendt, Paul W. Mertens, Marc M. Heyns
Chapter 7: Back-End-of-Line Cleaning
Abstract:Atomic force microscope (AFM) with inclined sample measurement and hydrophobic functionalized AFM probe was used to visualize the sidewall of...
197
Authors: Chuan Yu Yen, Mu Chien Luo, Kuo Bin Huang, Ting Chun Wang
Chapter 3: Surface Chemistry and Functionalisation
Abstract:The continually increasing complexity of IC integration drives the reduction of device dimensions. Because of this, material loss that alters...
86