Advanced TXRF Analysis: Background Reduction when Measuring High-k Materials and Mapping Metallic Contamination |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
285-288 |
| DOI |
10.4028/www.scientific.net/SSP.134.285 |
| Citation |
Chris Sparks et al., 2007, Solid State Phenomena, 134, 285 |
| Online since |
November, 2007 |
| Authors |
Chris Sparks, Joel Barnett, Diane K. Michelson, Carolyn Gondran, Seung Chul Song, Angela Martinez, Hikari Takahara, Hiroyuki Murakami, Toru Kinashi |
| Keywords |
Contamination Mapping, High-k Dielectrics, Metal Gate Etch, TXRF |
| Full Paper |
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