Paper Title:
Effect of an Organic Inhibitor in High pH Chemical Rinse on the Platen for Cu-CMP
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Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
299-302
DOI
10.4028/www.scientific.net/SSP.134.299
Citation
S. Petitdidier, K. Bartosh, C. Trouiller, A. Couvrat, J. Liu, M. Zaleski, "Effect of an Organic Inhibitor in High pH Chemical Rinse on the Platen for Cu-CMP", Solid State Phenomena, Vol. 134, pp. 299-302, 2008
Online since
November 2007
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