Paper Title:

Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.

Periodical Solid State Phenomena (Volume 134)
Main Theme Ultra Clean Processing of Semiconductor Surfaces VIII
Edited by Paul Mertens, Marc Meuris and Marc Heyns
Pages 3-6
DOI 10.4028/www.scientific.net/SSP.134.3
Citation Gerardo Montaño-Miranda et al., 2007, Solid State Phenomena, 134, 3
Online since November 2007
Authors Gerardo Montaño-Miranda, Anthony Muscat
Keywords Gas Phase Etching, HF, Surface Characterization, Surface Preparation, Water
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