Paper Title:
Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.
| Periodical |
Solid State Phenomena (Volume 134)
|
| Main Theme |
Ultra Clean Processing of Semiconductor Surfaces VIII
|
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
3-6 |
| DOI |
10.4028/www.scientific.net/SSP.134.3 |
| Citation |
Gerardo Montaño-Miranda et al., 2007, Solid State Phenomena, 134, 3 |
| Online since |
November, 2007 |
| Authors |
Gerardo Montaño-Miranda, Anthony Muscat |
| Keywords |
Gas Phase Etching, HF, Surface Characterization, Surface Preparation, Water |
| Price |
US$ 28,- |