Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination. |
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| Journal | Solid State Phenomena (Volume 134) |
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| Volume | Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by | Paul Mertens, Marc Meuris and Marc Heyns |
| Pages | 3-6 |
| DOI | 10.4028/www.scientific.net/SSP.134.3 |
| Online since | November, 2007 |
| Authors | Gerardo Montaño-Miranda, Anthony Muscat |
| Keywords | Gas Phase Etching, HF, Surface Characterization, Surface Preparation, Water |
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