Paper Title:
The Dependence of Chemical Mechanical Polishing Residue Removal on Post-Cleaning Treatments
  Abstract

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Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
303-306
DOI
10.4028/www.scientific.net/SSP.134.303
Citation
J. G. Choi, H. G. Yoon, W. J. Kim, G. M. Choi, Y. W. Song, J. G. Park, "The Dependence of Chemical Mechanical Polishing Residue Removal on Post-Cleaning Treatments ", Solid State Phenomena, Vol. 134, pp. 303-306, 2008
Online since
November 2007
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