Paper Title:
Improvement of Contact Clean Using Single-Wafer Clean Process for 90nm and Beyond
  Abstract

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Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
313-316
DOI
10.4028/www.scientific.net/SSP.134.313
Citation
J. W. Nam, A. Zagrebelny, R. Blumenthal, J. Block, M. Duray, B. Aegerter, "Improvement of Contact Clean Using Single-Wafer Clean Process for 90nm and Beyond ", Solid State Phenomena, Vol. 134, pp. 313-316, 2008
Online since
November 2007
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