Paper Title:
Photoresist Characterization and Wet Strip after Low-k Dry Etch
  Abstract

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Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
325-328
DOI
10.4028/www.scientific.net/SSP.134.325
Citation
M. Claes, Q. T. Le, J. Keldermans, E. Kesters, M. Lux, A. Franquet, G. Vereecke, P. W. Mertens, M.M. Frank, R. Carleer, P. Adriaensens, D. Vanderzande, "Photoresist Characterization and Wet Strip after Low-k Dry Etch ", Solid State Phenomena, Vol. 134, pp. 325-328, 2008
Online since
November 2007
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