Photoresist Characterization and Wet Strip after Low-k Dry Etch |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
325-328 |
| DOI |
10.4028/www.scientific.net/SSP.134.325 |
| Citation |
Martine Claes et al., 2007, Solid State Phenomena, 134, 325 |
| Online since |
November, 2007 |
| Authors |
Martine Claes, Quoc Toan Le, J. Keldermans, E. Kesters, Marcel Lux, A. Franquet, Guy Vereecke, Paul W. Mertens, M.M. Frank, Robert Carleer, P. Adriaensens, D. Vanderzande |
| Keywords |
BEOL, Low-K, Megasonic, Polymer Characterization, Post-Etch Photoresist, Solvent |
| Full Paper |
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