Paper Title:
Study of Resist Strip Chemistries for Ultra Low-k/Cu Interconnect
  Abstract

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Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
351-354
DOI
10.4028/www.scientific.net/SSP.134.351
Citation
H. Xu, T. David, Y. Xu, V. Tarasov, N. Possémé, D. Louis, "Study of Resist Strip Chemistries for Ultra Low-k/Cu Interconnect", Solid State Phenomena, Vol. 134, pp. 351-354, 2008
Online since
November 2007
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