Paper Title:
Effect of Wafer Rotation on Photoresist Stripping in Supercritical CO2
  Abstract

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Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
355-358
DOI
10.4028/www.scientific.net/SSP.134.355
Citation
K. Saga, H. Kuniyasu, T. Hattori, K. Saito, I. Mizobata, T. Iwata, S. Hirae, "Effect of Wafer Rotation on Photoresist Stripping in Supercritical CO2", Solid State Phenomena, Vol. 134, pp. 355-358, 2008
Online since
November 2007
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