Paper Title:
Mechanism and Principles of Post Etch Al Cleaning with Inorganic Acids
  Abstract

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Periodical
Solid State Phenomena (Volume 134)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
363-366
DOI
10.4028/www.scientific.net/SSP.134.363
Citation
S. Verhaverbeke, R. Gouk, J. Papanu, H. W. Chen, "Mechanism and Principles of Post Etch Al Cleaning with Inorganic Acids", Solid State Phenomena, Vol. 134, pp. 363-366, 2008
Online since
November 2007
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